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November 1, 1991Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Ion impact etch anisotropy downstream from diffusion plasma sources

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Authors

MGMatthew GoecknerWest Virginia UniversityJGJ. GoreeUniversity of IowaTST. E. SheridanOhio Northern University

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Goeckner et al. (1991) studied this question.

synapsesocial.com/papers/6aa028e417df3e2a23e61f7fhttps://doi.org/10.1116/1.577142
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