Robust multilayer patterns have been created via layer-by-layer self-assembly using a photochemical linking process that involves aromatic azo group cleavage and coupling with carbonyl oxygens from an adjacent polymer strand. The patterning is based on the solubility difference of the photoreactive multilayer before and after UV irradiation. The Figure shows an AFM image of a stripe pattern obtained by selective irradiation.
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Shi et al. (2002) studied this question.
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