Synthesis and Characterization of Plasma-Polymerized HMDSO Films Using an Ion Gun Inverse Magnetron Source

Plasma-polymerized hexamethyldisiloxane (PPHMDSO) films have been deposited using an ion gun inverse magnetron source at low pressure with Ar/O2/N2/HMDSO plasmas. Deposition rates and structures of the highly cross-linked PPHMDSO layers have been determined. Surface mechanical properties were studied using the nanoindentation technique, and wettability was measured by contact angle method and modifications induced on optical properties were studied at different wavelengths. Results showed remarkable differences in hardness and contact angles of distilled water depending on the plasma conditions. In addition, plasma parameters also had a very significant effect on the background fluorescence.