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October 1, 1995Japanese Journal of Applied PhysicsOpen Access

A New Technology for Negative Ion Detection and the Rapid Electron Cooling in a Pulsed High-Density Etching Plasma

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Authors

TAT. H. AhnKNKeiji NakamuraKyushu UniversityHSHideo Sugai Hideo SugaiNagoya University

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Ahn et al. (1995) studied this question.

synapsesocial.com/papers/6aa0fef58eabfe21f24f8334https://doi.org/10.1143/jjap.34.l1405
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