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This paper descrives experimental evidence that the etch rate in the dry photoetching of an organic resist, copolymer of 3,3,4,4,5,5,6,6,6-nonafluorohexyl methacrylate with methyl methacrylate, depends on the initial-film thickness as well as on the exposure time. The results indicate the predominance of a bulk effect over a surface effect during photoetching.
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Ueno et al. (1986) studied this question.
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