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May 1, 1993Chemistry of Materials

Chemical vapor deposition of vanadium, niobium, and tantalum nitride thin films

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RFRenaud M. FixHarvard UniversityRGRoy G. GordonRutgers, The State University of New JerseyDHDavid M. HoffmanCedars-Sinai Medical Center

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Fix et al. (1993) studied this question.

synapsesocial.com/papers/6aa232da9381edd5a407ef7chttps://doi.org/10.1021/cm00029a007
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