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We report the imprinting of nanometer-scale gratings by interferometric lithography at /spl lambda/=46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications.
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Capeluto et al. (2006) studied this question.
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