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Composition uniformity of InGaP thick epitaxial layers grown on InGaP/GaP graded buffer structure was studied by stepwise wet chemical etching and low temperature photoluminescence. We compared properties of two epitaxial layers grown by MOCVD technique on different graded buffers. Influence of strain and growth condition on the properties of both epitaxial layer was studied and related to the buffer design. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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Gregušová et al. (2007) studied this question.
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