Metallorganic Chemical Vapor Deposition of Hafnium Silicate Thin Films Using a Dual Source Dimethyl-alkylamido Approach, Consiglio, Steven, Papadatos, Filippos, Naczas, Sebastian, Skordas, Spyridon, Eisenbraun, Eric T., Kaloyeros, Alain E.
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Consiglio et al. (2006) studied this question.
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