HfO2 Gate Dielectrics Deposited via Tetrakis Diethylamido Hafnium , Schaeffer, J., Edwards, N. V., Liu, R., Roan, D., Hradsky, B., Gregory, R., Kulik, J., Duda, E., Contreras, L., Christiansen, J., Zollner, S., Tobin, P., Nguyen, B.-Y., Nieh, R., Ramon, M., Rao, R., Hegde, R., Rai, R., Baker, J., Voight, S.
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Schaeffer et al. (2003) studied this question.
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