Effect of magnetron configuration on the spatial distribution of sputtered species in high-power impulse magnetron sputtering (HiPIMS) plasmas

This study examines the two-dimensional (2D) spatial distribution of the ionized flux fraction (IFF) and total flux of sputtered species in a non-reactive high-power impulse magnetron sputtering discharge for a peak current density of ≈1.3 A/cm 2 . Five magnetic configurations of the magnetron cathode, ranging from highly unbalanced to highly balanced, were systematically investigated. Flux measurements were performed using a quartz crystal microbalance with an electron magnetic filter. IFF was axially and radially scanned in the diffusion plasma in a plane normal to the target. These measurements resulted in comprehensive 2D maps of the metal ions' flux distribution within the region of particular interest, where the substrates are typically placed. The experimental findings are further compared and correlated with the modeled magnetic field distribution. Our study provides deeper insight into the impact of the magnets’ arrangement on the thin film deposition process, offering potential benefits for a wide range of applications where tailored thin film properties are essential. • This study presents the first detailed 2D maps of metal ions' flux distribution across the entire substrate region. • Direct measurements of total sputtered flux and ionized flux fraction were done using the QCM probe with an electron filter. • Five magnetron magnetic configurations, from very unbalanced to highly balanced, were systematically investigated. • The spatial distribution of the ionized flux fraction was correlated with the magnetic field distribution. • The findings make a significant contribution to experimental studies of the spatial distribution of film-forming species.