A design methodology for linear evaporation source nozzles: Rapid configuration, predictable tuning, and scalability

The linear evaporation source nozzle directly influences deposited film uniformity and material utilization. Currently, obtaining deposition curves relies heavily on experimental methods or extensive numerical simulations, leading to long design iteration cycles and high costs. In this paper, a numerical model is established that reveals the intrinsic relationships between deposition profiles under different nozzle configurations, providing a more rapid and predictable method for designing the linear evaporation sources. Furthermore, with all dimensions normalized based on the nozzle diameter, the configurations obtained using this method can be scaled proportionally to accommodate a wider range of substrate sizes. This method has been successfully employed to engineer a linear evaporation source, which has been experimentally validated, with uniformity of the deposited film better than 3%. This work provides an effective technical pathway for rapidly obtaining initial source structures suitable for low evaporation rate conditions.