We describe a miniature sputtering system incorporating an unconventional magnetron gun and a right angle sputtering geometry. The design essentially eliminates the negative ion resputtering effect encountered in the sputtering of high Tc oxide films. The geometry is compatible with the in-plane and conventional θ–2θ diffraction geometries and a chamber with two appropriate sector x-ray windows has been constructed and operated at a synchrotron. Detailed data on the performance of the sputtering gun are presented.
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Zheng et al. (1991) studied this question.
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