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Nanocomposite films containing silver particles embedded in SiO 2 matrix were prepared by high pressure (~40 Pa) d.c. sputtering technique in an argon plasma on fused silica substrate. Particle size and metal volume fraction were tailored by varying the substrate temperature ( T s ~233-300 K) and deposition time (15-240 s). Reduction in size and volume fraction of metal particles culminated in blue-shift of the surface plasmon resonance peak in the optical absorbance spectra of the films. Absence of surface plasmon peak in the absorption spectra below a critical particle size and metal concentration of the nanocomposite films and appearance of sharp absorption edge in the absorbance spectra within the UV-VIS range indicated the semiconducting behaviour of the ultrafine silver particles. Experimental absorbance spectra were theoretically simulated by Mie scattering theory and Maxwell-Garnett effective medium theory.
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Mandal et al. (2002) studied this question.
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