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This letter presents a highly sensitive near-infrared (IR)a-Si:H phototransistor for touch sensor applications. The narrow bandgap ofa-Si exhibits a wideband spectrum response from IR to ultraviolet region, where the IR bandpass filter layers allow thea-Si:H phototransistor to respond to the selective IR light uninterrupted by visible light. The time-resolved photoresponse and transferI–Vcharacteristics for the near-IRa-Si:H phototransistor as a function of power at 785-nm illumination allow the observation of fast photoresponse (τ ~ 0.1ps), high external quantum efficiency (7.52), and high photoresponse. A prototype unit pixel structure for touch sensors composed of amorphous Si-based switching/amplification/near-IR phototransistors and a storage capacitor, is proposed and designed. The overall results suggest that the near-IRa-Si:H phototransistor offers unique possibilities for user-friendly, low-cost, and large-area touch sensors, especially aimed at consumer applications and other areas of optoelectronics.
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Lee et al. (2014) studied this question.
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