A theoretical model utilizing finite element methods is proposed to analyze low pressure chemical vapor deposition of by pyrolysis of tetraethoxysilane (TEOS). This model incorporates both the homogeneous gas‐phase reactions and the heterogeneous surface processes. The predicted values from the proposed model agreed very well with the experimental results. Besides accurately predicting the experimental data we have also estimated the forward and backward reaction rate constants for the gas‐phase equilibrium reaction of TEOS.
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Kalidindi et al. (1990) studied this question.
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