Ligand effect on In–Ti-oxo nanoclusters for nanolithography

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spin-coating with 50 nm resolution patterns for lithography. To gain insight into the exposure mechanisms, a combination of DFT calculations, TGA-MS, XPS, and AFM-IR was used, indicating that the decarboxylation of the ligands significantly contributes to the solubility-switching behaviors necessary for lithography. These findings offer generalizable synthetic methods to expand the In-Ti-oxo cluster structural chemistry and highlight the efficacy of tailored structural modulation of cluster materials in enhancing solution processability and lithography performance, providing valuable insights for future material design and applications.