Summary: Continuous and modulated c‐C4F8 (perfluorocyclobutane) plasmas were used to deposit thin Teflon‐like films. Gas phase and film composition and structure were investigated and the results can be rationalized with the deposition mechanism developed in a previous work for C2F4‐modulated plasmas. The effect of modulation on the morphology and the chemistry of the surface were studied. CFx percentages as a function of the duty cycle for films deposited for 90 min from modulated discharges sustained at 100 W, 300 mtorr, and 6 sccm. magnified image CFx percentages as a function of the duty cycle for films deposited for 90 min from modulated discharges sustained at 100 W, 300 mtorr, and 6 sccm.
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Milella et al. (2004) studied this question.
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