157nm Lithography. Window of Opportunity.

This keynote paper looks at the window of opportunity for 157nm lithography. The issues and challenges of the new 157nm lithography are identified and reviewed in the context of optical scanning system development. Major developments associated with the solution to problems are detailed: Optical material development; birefringence of optical materials; convergence of optics designs; contamination purging; and 157nm laser illumination. Micrascan VII and AT systems are highlighted.Resolution performance is projected against the Semiconductor Industry Association Roadmap. Both measured data as well as predictions of system performance are given. The window of opportunity for 157nm lithography is confirmed.