Growth, stability, and desorption of Ag films on Ni(111)

Growth modes and annealing behaviour of vapour-deposited Ag films on Ni(111) are analysed in detail by means of LEED and AES. For RT deposition an initially two-dimensional (2D) layer-by-layer growth of the Ag films is observed changing into a more 3D one at film thicknesses of about five monolayers (ML). Annealing the films at temperatures around 200 °C induces a reduction of the growth inhomogeneities. At temperatures above 300 °C the films disintegrate into 3D islands. During disintegration the two bottom ML of the films are preserved. At temperatures above 500 °C the Ag desorbes via the following stages: desorption of the 3D Ag islands, 2D desorption of the two bottom Ag ML, desorption of Ag atoms at Ni steps, desorption of Ag atoms at Ni kinks.