Light-Patterned and Recognition-Directed Adsorption of Nanoparticles at a Silicon Wafer Substrate

A silicon wafer was modified by chemisorption of a monolayer of a cation precursor and exposed to blue light through a mask. In the regions exposed to blue light, the cation precursor was converted to cation. These cations were recognized and bound selectively by nanoparticles modified by adsorption of crown. As a consequence, these crown-modified nanoparticles were adsorbed at only the desired regions and pattern transfer was affected.