Structure modification of radio frequency sputtered LaB6 thin films by internal stress

Thin films of LaB6 are prepared by a radio frequency (rf) magnetron sputtering technique. The effect of sputtering conditions on the film properties of internal stress and crystalline orientation are investigated. The film deposited at low pressures (<1 Pa) has a strong compressive stress as high as 109 Pa. As the pressure of Ar discharge gas decreases, the internal stress becomes greater and the preferred orientation is transformed in the sequence: (100)→(110)→(111). This behavior can be explained as an energetically favorable structure of LaB6 film by taking both the surface energy and the strain energy into account. An application of a negative bias (−20 V) to substrates results in a greater stress, so that the (110) and (111) orientation becomes more preferential.