Smooth Continuous Films of Stoichiometric Silicon Carbide from Poly(methylsilyne)

A new synthesis of the silicon‐network‐backbone polymer poly(methylsilyne) gives a material that is easily converted by pyrolysis to smooth continous films of stoichiometric silicon carbide (see Figure). The films are adherent to the silicon or alumina substrates, and show root mean square roughness of 169 Å over a 500 μm range. Applications in electronics are envisaged.