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March 4, 1991Applied Physics Letters

Low radio frequency biased electron cyclotron resonance plasma etching

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Authors

SSSeiji SamukawaNational Yang Ming Chiao Tung UniversityTTTomohiko ToyosatoEWEtsuo Wani

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Samukawa et al. (1991) studied this question.

synapsesocial.com/papers/6aa8196b21935eeb4071399chttps://doi.org/10.1063/1.104469
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