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Abstract 2,4,6-Tris[2-(p-toluenesulfonyloxy)ethyl]-1,3,5-trioxane was prepared to be subjected to the acid-catalyzed decomposition to release three p-toluenesulfonic acid molecules which were able to act as an acid amplifier to enhance the photosensitivity of a chemically amplified photoresist.
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Arimitsu et al. (1998) studied this question.
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