Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

Electron-beam-induced deposition was performed to fabricate nanostructures using a subnanometer-sized probe of high-energy electrons emitted by a 200 kV transmission electron microscope equipped with a field emission gun. We fabricated nanometer-sized dots with a diameter of less than 5 nm, controlling their position and size by the introduction of a organometallic precursor gas near the substrate surface. The relation between the size of the deposit and the deposition time was studied, and, in addition, the effect of the substrate thickness was examined.