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An emission spectroscopy study is made of an rf magnetron discharge used to sputter deposit CdTe in Ar. The dependence on gas pressure and rf power of the strongest Cd, Te, and Ar emission line intensities (I) is determined for both the negative glow and the positive column. It is shown that the sputtered atom density NCd (NTe) is proportional to ICd/IAr (ITe/IAr) as the rf power is varied at pressures near 0.5 Pa, and that such a relationship does not hold as the gas pressure is varied. From the power dependence of IAr it is deduced that Ar atoms are excited to emitting states directly from the ground state; no evidence for the influence of intermediate metastable states is observed.
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Cook et al. (1989) studied this question.
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