Answers are grounded in this paper and cite their sources.
Spectroscopic analysis demonstrates determination of reactive particle density in etching discharges, indicating a simplified optical diagnostic approach.
The addition of a small concentration of suitably chosen noble gas to a reactive plasma is shown to permit the determination of the functional dependence of reactive particle density on plasma parameters. Examples illustrating the simplicity of this method are presented using F atomic emission from plasma-etching discharges and a comparison is made to available data in the literature.
No takes yet. Share an insight, caveat, or question.
Coburn et al. (1980) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: