Answers are grounded in this paper and cite their sources.
The synergistic and competitive relationship of glycine and benzotriazole (BTA) in a peroxide-based weakly alkaline slurry during the copper chemical mechanical planarization (CMP) process was studied. Based on the experimental results, we systematically analyzed the reaction mechanism of glycine and BTA in an alkaline environment; their corrosion and passivation mechanism was also discussed, which can verify the planarization performance through step height reduction efficiency. We proposed the planarization mechanism of the glycine-BTA system polishing slurry to provide a theoretical basis for the CMP planarization. It also has important reference value for the study of weakly alkaline copper CMP in the future.
No takes yet. Share an insight, caveat, or question.
Yan et al. (2016) studied this question.
Synapse has enriched 10 related papers. Consider them for comparative context: