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July 1, 1994Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Deposition of single phase, homogeneous silicon oxynitride by remote plasma-enhanced chemical vapor deposition, and electrical evaluation in metal–insulator–semiconductor devices

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Authors

YMYan MaGLG. LucovskyNorth Carolina State University

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Ma et al. (1994) studied this question.

synapsesocial.com/papers/6aa9e90cf8c08cbefbf6ab68https://doi.org/10.1116/1.587792
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