Plasma Parameter Variations in Ion Beam Formation Mode of a Double Plasma Device

In the present investigation, our focus is to study the plasma parameter variation occurring in the diffused plasma (target chamber) of a double plasma device, where an ion beam can be injected by two different methods. A low energy ion beam (10–30 eV) is produced in our present study. It is observed that depending on the method by which the beam is formed, the target (diffused) plasma parameters alter significantly. Also it is observed that, the ion-sheath formed at the separation grid of the device expands or contracts depending on the method, which forms the beam.