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The formation by chemical vapor deposition (CVD) of chromium metal as coatings on various substrates was studied using the reaction Process parameters of temperature, gas flow rate, and chromium chloride concentration influenced the deposition rate. The chromium metal deposited had properties similar to high‐purity "iodide" chromium. Surface appearance and grain structure differed from materials such as titanium, deposited in earlier studies. This is suggested to result from difference in the controlling mechanism of the reduction reaction and evidence for this mechanism was observed.
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G.F. Wakefield (1969) studied this question.
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