Seamless Pattern Fabrication of Large-Area Nanostructures Using Ultraviolet Nanoimprint Lithography

The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 ×45 mm 2 pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.