Atomic layer deposition (ALD) is a method of choice for the growth of highly conformal thin films with accurately controlled thickness on planar and nanostructured surfaces . These advantages make it pivotal for emerging nanotechnology applications. This review sheds light on the current developments on the ALD of vanadium oxide , which, with proper postdeposition treatment yields a variety of functional and smart oxide phases. The application of vanadium oxide coatings in electrochemical energy storage , microelectronics and smart windows are emphasized.
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Prasadam et al. (2019) studied this question.
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