Lg = 80 -nm Trigate Quantum-Well In0.53Ga0.47As Metal–Oxide–Semiconductor Field-Effect Transistors With Al2O3/HfO2 Gate-Stack

We report on Lg= 80-nm trigate quantumwell InGaAs metal-oxide-semiconductor field-effect transistors (MOSFETs) with record combination of subthreshold swing, transconductance and ON-current performance. The device features a multilayer cap design, bilayer Al2O3/HfO2(0.7/2 nm) gate-stack by atomic layer deposition and dry etched In0.53Ga0.47As fin. An Lg= 80-nm trigate MOSFET with fin-width (Wfin) = 30 nm and fin-height (Hfin) = 20 nm exhibits excellent performance, such as ON-resistance (RON) = 220 Ω-μm, subthreshold swing (S) = 82 mV/dec, and drain-induced-barrier lowering = 10 mV/V at VDS= 0.5 V. Besides, the device exhibits record values of maximum transconductance (gm_max) = 1800 μS/μm and ION= 0.41 mA/μm at VDS= 0.5 V, and a record combination of gm_maxand S in any III-V nonplanar MOSFET technology.