A coincidence ion beam analysis methodology for high resolution depth profiling of nickel using a resonance in the 58Ni(p, γ)59Cu reaction

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A coincidence mode Ion Beam Analysis (CIBA) methodology has been standardised for the depth profiling of nickel. The methodology is unique, as the 1424 keV resonance in the 58 Ni(p, γ ) 59 Cu reaction was utilised for interference free determination and depth profiling of nickel, using four channel high-speed digitizer, in coincidence spectroscopy mode (CI-NRRA). The aforementioned reaction, with a Q value of 3.42 MeV, emits characteristic γ -rays of 4817.7 keV, 4326.6 keV, and 491.1 keV energy. The 4326.6 keV, 491.1 keV γ -rays, emitted concomitantly, in the two-step cascade transition of the 4817.7 keV excited state, were detected in coincidence mode. Angular correlation studies were carried out to maximize coincidence events. Nickel depth profiling was carried out in Ni/Si, Cr/Ni/Si, Nb-W-Ta/Ni/Si films and Ni bulk targets. CI-NRRA facilitated the removal of interferences from chromium (Cr) and silicon (Si). The present study, which enables high resolution depth profile of Ni in various substrates, is the first of its kind to carry out Nuclear Resonance Reaction Analysis (NRRA) in coincidence mode for the depth profiling.