A modified Thomas-Fermi approximation (TFA) developed originally for inversion layers is used to calculate electron-density profiles, the spatial dependences of the potential, surface potentials, and the energies of bound states of depletion and accumulation layers in n-type GaAs. Remarkable agreement with recently published results of self-consistent calculations of Ehlers and Mills [Phys. Rev. B 34, 3939 (1986)] is achieved. All deficiencies of the conventional TFA discussed there are removed. Methodological advantages of the modified TFA are discussed.
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Übensee et al. (1989) studied this question.
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