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We have studied the stress reliability of high-kappa Ni/TiO2/ZrO2/TiN metal-insulator-metal capacitors under constant-voltage stress. The increasing TiO2thickness on ZrO2improves the 125-degC leakage current, capacitance variation (DeltaC/C), and long-term reliability. For a high density of 26 fF/mum2, good extrapolated ten-year reliability of small DeltaC/C~ 0.71% is obtained for the Ni/10-nm-TiO2/6.5-nm- ZrO2/ TiN device at 2.5-V operation.
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Lin et al. (2009) studied this question.
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