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The industrial use of silicon on insulator (SOI) substrates is quickly spreading. For microelectronics applications, this material brings new functionality, such as radiation-hard, high-voltage or low-voltage and low-consumption integrated circuits. Industrial wafers are now commercially available and new technologies, such as Smart Cut ® from SOITEC company, will provide low prices in high-volume production. SOI also provides very important features for microelectromechanical systems (MEMS) and new industrial products, such as high-temperature and low-noise piezoresistive pressure sensors or miniature high-performance capacitive pressure and acceleration sensors, are now proposed. These new generic technologies will provide various industrial products in the near future.
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S. Renard (2000) studied this question.
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