Formation energies and concentrations of the most relevant point defects in n -type wurtzite AlN are obtained by first-principle calculations employing a hybrid functional. We show that the incorporation of Si is favoured over O under N-rich growth conditions, but not under Al-rich conditions. The triply negatively charged Al vacancy is found to be the defect with the lowest formation energy in n -type AlN and it is therefore expected to be the main compensating acceptor. Under typical physical vapor-phase transport growth conditions, we predict Si concentrations of up to 10 20 cm − 3 and net donor concentrations of about 10 18 cm − 3 , in good agreement with available experimental data.
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Silvestri et al. (2012) studied this question.
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