Fabrication and characterization of pre-aligned gallium nitride nanowire field-effect transistors

We report on the fabrication of gallium nitride (GaN) nanowire field-effect transistors (FETs) with both bottom-gate and top-gate structures, with very high yield using a unique pre-alignment process. The catalyst positions were chosen to be aligned with the source/drain position, and Ni catalysts with a diameter of 200 nm were deposited selectively at these pre-determined positions. Electrostatic analysis was performed for the bottom-gate devices to estimate the nanowire's electrical characteristics. Comparison of the bottom-gate and the top-gate structures indicated that better performance, in terms of saturation and breakdown characteristics, can be obtained using the top-gate structure. For the top-gate nanowire FETs, temperature-dependent characteristics were investigated up to the current saturation regime, and memory effects were observed at room temperature.