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Single-crystal Ga1−xInxAs (x=0.4) grown on InP by molecular-beam epitaxy at low substrate temperatures (250–150 °C) has been examined by transmission electron microscopy. Arsenic precipitates were observed following an ex situ anneal at 550 °C. The precipitates coarsen during higher-temperature anneals at 600 and 700 °C. Microstructure dependence on the growth temperature was similar to that observed in low-temperature grown GaAs. Arsenic precipitate volume fraction increased with decreasing growth temperature, with a measured maximum value of ∼0.4%.
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Ibbetson et al. (1993) studied this question.
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