A high-power pulsed-magnetron discharge (several kW/cm 2 ) is described. It operates at pulse duration of the order of few μs, significantly shorter than in usual similar devices. The breakdown delay was reduced by using a low-current DC preionization. The study was performed for Cu target in Ar and He buffer gases by optical emission spectroscopy and electrical measurements. Saturation magnetron current is reached in a few μs which permits to shorten the pulse duration avoiding arc formation. Unusual high current density up to 10 A/cm 2 induces very fast transition toward the stable self-sputtering regime. High plasma density favours high ion flux to the substrate. Preliminary result on Cu deposit in trenches is reported.
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Vašina et al. (2005) studied this question.
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