Deuterium Retention in Pure and Mixed Plasma Facing Materials

Depth profiles of D atoms and D 2 molecules in beryllium (Be), beryllium oxide (BeO), tungsten (W), chemically vapor deposited (CVD) tungsten carbide WC, and tungsten trioxide (WO 3 ) both implanted with D ions at energies in the range of several keV and exposed to a low energy (30–200 eV) D plasma have been determined using secondary ion mass spectrometry (SIMS) and residual gas analysis (RGA) measurements in the course of surface sputtering. Additionally, the deuterium retention in carbon (C) and tungsten-carbon (W-C) mixed films deposited by reactive magnetron sputtering in D 2 atmosphere has been investigated. Mechanisms of the deuterium trapping in these materials are discussed.