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March 1, 2006Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Simulation of the spatial distribution and molecular weight of polymethylmethacrylate fragments in electron beam lithography exposures

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MAMirwais AktaryMSMaria StepanovaSDS. K. Dew

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Aktary et al. (2006) studied this question.

synapsesocial.com/papers/6ab1eb9751e7773e40c8ea55https://doi.org/10.1116/1.2181580
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