The effects of combining an RF inductively coupled plasma (ICP) with a conventional planar magnetron sputtering discharge have been investigated. The planar magnetron discharge is assisted by the ICP, which is sustained by a helical RF coil immersed in the plasma. Use of the technique significantly enhances the plasma density and the sputtering discharge current. Optical emission measurements of Al ions and neutral lines indicate marked enhancement of ionization of the sputtered atoms after they pass through the dense ICP region.
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Setsuhara et al. (1997) studied this question.
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