Improvement of total-dose irradiation hardness of silicon-on-insulator materials by modifying the buried oxide layer with ion implantation, Zhang En-Xia, Qian Cong, Zhang Zheng-Xuan, Lin Cheng-Lu, Wang Xi, Wang Ying-Min, Wang Xiao-He, Zhao Gui-Ru, En Yun-Fei, Luo Hong-Wei, Shi Qian
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Cong et al. (2006) studied this question.
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