Thin Pb and Bi overlayers on Ni(110) have been studied by use of variable-energy photoelectron spectroscopy. The overlayers are characterized by use of the Pb and Bi 5d core-level intensities and binding-energy shifts. The Pb 5d cross section ({σ}) and 5d5/2:5d3/2 branching-ratio (BR) dependence as a function of photon energy are quite sensitive to the thickness of the overlayer: as the thickness increases, the cross-section maximum shifts to lower photon energy. This shift is reflected by the point at which the BR crosses the statistical 1.5 value: 57.5 eV for 0.5 monolayer to 42.5 eV for bulk Pb. We postulate that this behavior is due to the sensitive nature of the outgoing f-wave potential, as shown recently by theoretical calculations of heavy-metal d cross sections.
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Gürtler et al. (1987) studied this question.
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