Steady-state morphologies of NH₄F-etched Si(111) surfaces were investigated with scanning tunneling microscopy and kinetic Monte Carlo simulations. In stirred solutions, dynamic step-step repulsion, which is mediated by small etch pits, leads to the production of surfaces that are significantly smoother than the equilibrium limit as evidenced by terrace width distributions. In unstirred solutions, surfaces with a low density of steps show profound step bunching, while those with a high density of steps do not. This effect is attributed to step-step attractions mediated by spatially localized autocatalytic reactions.
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Huang et al. (1998) studied this question.
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