What question did this study set out to answer?

To determine how varying the pH of aqueous hydrofluoric acid etching solutions affects the structural quality and hydrogen termination of Si(111) surfaces.

February 12, 1990Applied Physics Letters

Ideal hydrogen termination of the Si (111) surface

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Authors

GHG. S. HigashiAdvanced Micro Devices (United States)YCYves J. ChabalRutgers, The State University of New Jersey GTGary W. TrucksAT&T (United States)

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Implication

Spectroscopic analysis demonstrates ideal hydrogen termination on silicon (111) surfaces at basic pH, indicating a route to defect-free semiconductor interfaces.

Key Points

To determine how varying the pH of aqueous hydrofluoric acid etching solutions affects the structural quality and hydrogen termination of Si(111) surfaces.
Etched silicon (111) surfaces in aqueous hydrofluoric acid solutions prepared across a range of pH levels.
Characterized surface structure, chemical homogeneity, and bond orientation by measuring Si–H stretching vibrations with infrared absorption spectroscopy.
Basic solutions (pH 9–10) yielded ideally terminated Si(111) surfaces featuring silicon monohydride bonds oriented normal to the surface plane.
Treated surfaces demonstrated high homogeneity characterized by a defect density under 0.5% and a narrow vibrational linewidth of 0.95 cm⁻¹.

Cite This Study

Higashi et al. (1990) studied this question.

synapsesocial.com/papers/6a0ccec817d56fa39a4a4ffe https://doi.org/10.1063/1.102728

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Implication

Spectroscopic analysis demonstrates ideal hydrogen termination on silicon (111) surfaces at basic pH, indicating a route to defect-free semiconductor interfaces.

Ideal hydrogen termination of the Si (111) surface

Discussion

Member takes

Implication

Key Points

Cite This Study

Ideal hydrogen termination of the Si (111) surface

Discussion

Member takes

Implication

Key Points

Cite This Study

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